Elon Musk, Jensen Huang see China closing lithography gap by 2030

DIGITIMESOctober 3, 2026en

While ASML executives explore how to scale extreme ultraviolet (EUV) lithography output beyond 110 units by 2028, China is pursuing indigenous advanced lithography systems. ASML plans to produce at least 80 EUV tools in 2027 and is investigating a further capacity increase of approximately 30% in 2028 to satisfy massive global capital expenditure in artificial intelligence (AI) infrastructure. However, the prospect of domestic Chinese tools raises long-term uncertainty over the lithography landscape.

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